| Material Definition | A hollow cylindrical component made from fused silica, consisting primarily of silicon dioxide (SiO₂). | Provides a clean, chemically stable, and thermally resistant enclosure for heating, sensing, processing, and laboratory operations. |
| SiO₂ Purity | Common industrial grades typically contain approximately 99.9% to 99.99% SiO₂; the exact level depends on the manufacturing process and application. | Low impurity content helps reduce contamination in semiconductor, laboratory, optical, and high-temperature processes. |
| Maximum Working Temperature | Continuous-use temperatures are commonly around 900–1,100°C, while short-term service can be higher when thermal conditions are carefully controlled. | Suitable for furnace tubes, heat-treatment equipment, combustion systems, and high-temperature reaction environments. |
| Softening Point | Approximately 1,665°C. | Indicates strong resistance to deformation at temperatures where ordinary glass would lose its shape. |
| Coefficient of Thermal Expansion | Approximately 0.5–0.6 × 10⁻⁶/K near room temperature. | Very low expansion improves resistance to thermal shock during rapid heating and cooling cycles. |
| Thermal Shock Resistance | High relative to standard soda-lime and borosilicate glass, provided the tube is correctly designed and free from damage. | Helps minimize cracking when process temperatures change quickly. |
| Chemical Resistance | Resistant to water, many acids, and most process chemicals; concentrated hydrofluoric acid and hot concentrated alkaline solutions can attack silica. | Supports use in chemical processing, analytical equipment, laboratory systems, and corrosive atmospheres. |
| Density | Approximately 2.20 g/cm³. | Offers a relatively low weight while maintaining rigidity and dimensional stability. |
| Electrical Insulation | High electrical resistivity and low dielectric loss across a broad temperature range. | Useful for electrical insulation, high-voltage equipment, heating assemblies, and plasma-related systems. |
| Optical Transmission | High transmission from the ultraviolet into the infrared, with the practical range depending on purity, hydroxyl content, wall thickness, and surface finish. | Enables use in UV lamps, optical sensors, spectroscopy, photochemical equipment, and inspection systems. |
| Dimensional Stability | Maintains shape and size well under repeated thermal cycling when properly supported. | Improves process repeatability and reduces alignment changes in precision equipment. |
| Typical Tube Geometry | Available as straight tubes, capillary tubes, multi-bore tubes, and custom-shaped sections with different outer diameters, wall thicknesses, and lengths. | Allows the component to be adapted to furnaces, flow paths, lamps, sensors, and specialized process chambers. |
| Common Industrial Applications | Semiconductor processing, laboratory furnaces, thermal treatment, UV lighting, analytical instruments, chemical reactors, and protective sensor sleeves. | Combines thermal performance, chemical durability, optical clarity, and cleanliness in one component. |
| Key Selection Factors | Operating temperature, thermal cycling rate, chemical exposure, pressure or vacuum conditions, required optical range, tube dimensions, surface finish, and cleanliness level. | Correct specification helps prevent premature failure, contamination, thermal stress, and poor process performance. |